Silicon Etching in CF4/O2 and SF6 Atmospheres

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Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

120-123

Citation:

A. Silva et al., "Silicon Etching in CF4/O2 and SF6 Atmospheres", Materials Science Forum, Vols. 455-456, pp. 120-123, 2004

Online since:

May 2004

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$38.00

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