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HomeMaterials Science ForumMaterials Science Forum Vols. 455-456Batch Processing Method to Deposit a-Si:H Films by...

Batch Processing Method to Deposit a-Si:H Films by PECVD

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Advanced Materials Forum II

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Periodical:

Materials Science Forum (Volumes 455-456)

Pages:

104-107

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.455-456.104

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Online since:

May 2004

Authors:

Leandro Raniero, Hugo Águas, Luís Pereira, Elvira Fortunato, Isabel Ferreira, Rodrigo Martins

Keywords:

Intrinsic Amorphous Silicon, PECVD, Semiconductor

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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