Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

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Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

112-115

DOI:

10.4028/www.scientific.net/MSF.455-456.112

Citation:

L. Pereira et al., "Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition", Materials Science Forum, Vols. 455-456, pp. 112-115, 2004

Online since:

May 2004

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$35.00

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