Spiral Inductors on Silicon for Wireless Communications

P.M. Trabulo; D.A. Durães; P.M. Mendes; P.J. Garrido; J. Higino Correia

doi:10.4028/www.scientific.net/MSF.455-456.116

Paper Titles

Composition, Structure and Optical Characteristics of Polymorphous Silicon Films Deposited by PECVD at 27.12 MHz
p.100

Batch Processing Method to Deposit a-Si:H Films by PECVD
p.104

Influence of the Rapid Thermal Annealing on the Properties of Thin a-Si Films
p.108

Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition
p.112

Spiral Inductors on Silicon for Wireless Communications
p.116

Silicon Etching in CF₄/O₂ and SF₆ Atmospheres
p.120

Optimisation of a Home-Made RIE System - Effect of SF₆ Plasma on the Properties of Partially Etched a-Si:H Films
p.124

Optical and Morphological Properties of Annealed PbS Thin Films Obtained from a Chemical Solution.
p.128

Absolute Scale Reciprocal Space Mapping on X-Ray Diffractometers Incorporating a Position Sensitive Detector: Application to III-Nitride Semiconductors
p.132

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Spiral Inductors on Silicon for Wireless Communications

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Periodical:

Materials Science Forum (Volumes 455-456)

Pages:

116-119

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.455-456.116

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Online since:

May 2004

Authors:

P.M. Trabulo, D.A. Durães, P.M. Mendes, P.J. Garrido, J. Higino Correia

Keywords:

Bulk-Micromachining Technology, RFIC Devices, Silicon Spiral Inductors

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References

[1] J. N. Burghartz, D.C. Edelstein, M. Soyuer, H. A. Ainspan, K. A. Jenkins: IEEE Journal Solid-State Circuits Vol. 33 no. 12 (1998), p. (2028).

DOI: 10.1109/4.735544

Google Scholar

[2] T. H. Lee: The Design of CMOS Radio-Frequency Integrated Circuits, Cambridge University Press (1998), p.47.

Google Scholar

[3] B. Razavi: IEEE Journal Solid-State Circuits Vol. 34 no. 3 (1999), p.268.

Google Scholar

[4] J. N. Burghartz, M. Soyuer, and K. A. Jenkins: IEEE Trans. Electron Devices Vol. 43 no. 9 (1996), p.1559.

Google Scholar