Improvement of Field-Effect Mobilities in TFTs: Surface Plasma Treatments Vs Stack Dielectric Structures

G. Lavareda; C. Nunes de Carvalho; A. Amaral; Elvira Fortunato

doi:10.4028/www.scientific.net/MSF.455-456.64

Paper Titles

Structural and Dielectric Properties of Mg-Doped Strontium Titanate Ceramics: Dependence on the Materials Processing
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La(Mg_1/2Ti_1/2)O₃ – Based Materials for Microwave Applications
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Lead Zirconate Titanate Thin Films Prepared with Different Types of Seeds: A Comparison Study
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The Use of Thin Silicon Films in Flat Panel Displays
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Improvement of Field-Effect Mobilities in TFTs: Surface Plasma Treatments Vs Stack Dielectric Structures
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Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications
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MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge
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Characterization of Polymorphous Silicon Thin Film and Solar Cells
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Improvement of Field-Effect Mobilities in TFTs: Surface Plasma Treatments Vs Stack Dielectric Structures

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Materials Science Forum (Volumes 455-456)

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64-68

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https://doi.org/10.4028/www.scientific.net/MSF.455-456.64

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Online since:

May 2004

Authors:

G. Lavareda, C. Nunes de Carvalho, A. Amaral, Elvira Fortunato

Keywords:

a-SiC_x, a-SiN_x, a-SiO_x, Dielectric Structure, Plasma Treatment, TFTs

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