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HomeMaterials Science ForumMaterials Science Forum Vols. 455-456MIS Photodiodes of Polymorphous Silicon Deposited...

MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge

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Advanced Materials Forum II

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Periodical:

Materials Science Forum (Volumes 455-456)

Pages:

73-76

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.455-456.73

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Online since:

May 2004

Authors:

Hugo Águas, Luís Pereira, Leandro Raniero, Elvira Fortunato, Rodrigo Martins

Keywords:

Amorphous Silicon, MIS, PECVD 27MHz, Photodiode, Polymorphous Silicon

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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