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HomeMaterials Science ForumMaterials Science Forum Vols. 455-456Sputtering Preparation of Silicon Nitride Thin...

Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications

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Advanced Materials Forum II

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Periodical:

Materials Science Forum (Volumes 455-456)

Pages:

69-72

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.455-456.69

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Online since:

May 2004

Authors:

Luís Pereira, Hugo Águas, Rui Igreja, Rui Miguel S. Martins, N. Nedev, Leandro Raniero, Elvira Fortunato, Rodrigo Martins

Keywords:

Gate Dielectric, Sputtering

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© 2004 Trans Tech Publications Ltd. All Rights Reserved

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