Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications

Abstract:

Article Preview

Info:

Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

69-72

DOI:

10.4028/www.scientific.net/MSF.455-456.69

Citation:

L. Pereira et al., "Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications ", Materials Science Forum, Vols. 455-456, pp. 69-72, 2004

Online since:

May 2004

Export:

Price:

$35.00

In order to see related information, you need to Login.