Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications

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Periodical:

Materials Science Forum (Volumes 455-456)

Edited by:

Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias

Pages:

69-72

Citation:

L. Pereira et al., "Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications ", Materials Science Forum, Vols. 455-456, pp. 69-72, 2004

Online since:

May 2004

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Price:

$38.00

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