Effect of Heat Treatment on TiNx Film Structure

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Abstract:

TiN films with different nitrogen contents were deposited on glass and Si (100) substrates by d. c. magnetron reactive sputtering. The structure of the films was determined by Xray diffraction. It was found that heat treatment at 773 decreased the lattice parameter. A considerable thermal instability of over-stoichiometric films was observed after annealing films in air. This instability enhanced with increasing nitrogen content and is characterized by an abundant appearance of clear and dark disks in Scanning Electron Microscopy (SEM). Also, it was shown that the film instability does not come from an interfacial reaction but was observed when the TiNx layers present a (200) preferred orientation together with high nitrogen content.

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Materials Science Forum (Volumes 480-481)

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187-192

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March 2005

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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[1] E. P. Schmid, M. S. Sunaga and F. Levy, J. Vac. Sci. Technol. A 16 (5) (1998), p.2870.

Google Scholar

[2] J. P. Schaffer, A. J. Perry and J. Brunner, J. Vac. Sci. Technol. A 10 (1992), p.193.

Google Scholar

[3] S. Zerkout, S. Achour, A. Mosser and N. Tabet, Thin Solid Films, 441 (2003), p.135.

DOI: 10.1016/s0040-6090(03)00850-2

Google Scholar

[4] S. Logothetidis, e. Meletis, and G. Kourouklis, J. Mater. Res. 14 (1999), p.436.

Google Scholar

[5] L. E. Toth, Transition Metal Carbides and Nitrides, Academic Press. New York (1971).

Google Scholar

[6] C. G. H. Walker, S.A. Morton, J. M. Charnock, E. J. Maclean and N. M. D. Brown, Mat. Sci. Forum 325-326 (2000), p.131.

Google Scholar

[7] F. Elstner, A. Ehrlich, H. Geigengack, H. Kupfer and F. Richter, J. Vac. Sci. Technol. A 12 (2) (1994), p.472.

Google Scholar

[8] J. R. R. Manory and G. Kimmel, Surf. And Coat. Technol. 63 (1994), p.85.

Google Scholar

[9] J. Pelleg L. Z. Zevin, S. Lungo and N. Croitoru, Thin Solid Films 197 (1991), p.117.

DOI: 10.1016/0040-6090(91)90225-m

Google Scholar

[10] L. Hultman and J. -E. Sundgren, J. Appl. Phys. 66 (1989), p.536.

Google Scholar

[11] P. R. Kasansky, L. Hultman, I. Ivanov and Sundgren, J. Vac. Sci. Technol. A11 (1993), p.1426.

Google Scholar

[12] G. Lemperiere and J. M. Poitevin, Thin Solid Films 111 (1984), p.339.

Google Scholar

[13] J. -E. Sundgren, Thin Solid Films 128 (1985), p.21.

Google Scholar

[14] M. Ohring, The Materials Science of Thin Films, Academic Press (1992), p.241 Instable Stable Instable.

Google Scholar