Comparisons on Doping of Different Alkyl Compound on SiO2 to Form a Low-k Dielectric Material

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Periodical:

Materials Science Forum (Volumes 480-481)

Edited by:

A. Méndez-Vilas

Pages:

213-216

DOI:

10.4028/www.scientific.net/MSF.480-481.213

Citation:

A.Y.K. Lim and K. Ibrahim, "Comparisons on Doping of Different Alkyl Compound on SiO2 to Form a Low-k Dielectric Material", Materials Science Forum, Vols. 480-481, pp. 213-216, 2005

Online since:

March 2005

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$35.00

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