Effect of DC Bias Voltage on the Optical Properties of TiO2 Thin Film Deposited by Plasma Assisted Electron Beam Evaporation

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Materials Science Forum (Volumes 539-543)

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Edited by:

T. Chandra, K. Tsuzaki, M. Militzer , C. Ravindran

Pages:

3557-3561

Citation:

S. K. Hong et al., "Effect of DC Bias Voltage on the Optical Properties of TiO2 Thin Film Deposited by Plasma Assisted Electron Beam Evaporation", Materials Science Forum, Vols. 539-543, pp. 3557-3561, 2007

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March 2007

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[2] Handbook of Plasma Immersion Ion Implantation and Deposition edited by Andre' Anders, (2000).

[3] N. Kaiser, H.K. Pulker(Eds. ): Optical Interference Coating (2003).

[4] P. Madhu Kuma, S. Badrinarayanan, Murali Satry: Thin Solid Films 358(2000).

[5] M.M. Rahman, et al.: Journal of physics and chemistry of solids 60(1999), p.201.

[6] S. K. Hong, J. Y. Moon, etc al., Optical and Microstructural properties of TiO2, Al2O3 and SiO2 single layers deposited by plasma assisted E-beam evaporation, Materials Science Forum, Vol. 449-452, (2004) pp.961-964.

DOI: https://doi.org/10.4028/www.scientific.net/msf.449-452.961