Effect of DC Bias Voltage on the Optical Properties of TiO2 Thin Film Deposited by Plasma Assisted Electron Beam Evaporation

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Periodical:

Materials Science Forum (Volumes 539-543)

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Edited by:

T. Chandra, K. Tsuzaki, M. Militzer , C. Ravindran

Pages:

3557-3561

DOI:

10.4028/www.scientific.net/MSF.539-543.3557

Citation:

S. K. Hong et al., "Effect of DC Bias Voltage on the Optical Properties of TiO2 Thin Film Deposited by Plasma Assisted Electron Beam Evaporation", Materials Science Forum, Vols. 539-543, pp. 3557-3561, 2007

Online since:

March 2007

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