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HomeMaterials Science ForumMaterials Science Forum Vols. 539-543Effect of DC Bias Voltage on the Optical...

Effect of DC Bias Voltage on the Optical Properties of TiO₂ Thin Film Deposited by Plasma Assisted Electron Beam Evaporation

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THERMEC 2006

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Periodical:

Materials Science Forum (Volumes 539-543)

Pages:

3557-3561

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.539-543.3557

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Online since:

March 2007

Authors:

Sung Kil Hong, S.B. Jung, Young Chan Kim, W.K. Kee, Chang Seog Kang

Keywords:

DC Bias Volt, Plasma Assisted Electron-Beam Evaporation, Titania (TiO₂)

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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[1] Stephen M, Rossnagel, Jerome J, Cuomo, William D: westwood Noyes publications (1986)

[2] Handbook of Plasma Immersion Ion Implantation and Deposition edited by Andre' Anders,(2000)

[3] N.Kaiser, H.K. Pulker(Eds.): Optical Interference Coating (2003)

[4] P. Madhu Kuma, S. Badrinarayanan, Murali Satry: Thin Solid Films 358(2000)

[5] M.M. Rahman, et al.: Journal of physics and chemistry of solids 60(1999), p.201

[6] S. K. Hong, J. Y. Moon, etc al., "Optical and Microstructural properties of TiO2, Al2O3 and SiO2 single layers deposited by plasma assisted E-beam evaporation" Materials Science Forum, Vol. 449-452, (2004) pp.961-964

DOI: 10.4028/www.scientific.net/msf.449-452.961