An Overview of ms Annealing for Deep Sub-Micron Activation

Abstract:

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Millisecond annealing (MSA) has been developed over the last several years as a viable approach to achieve the high electrical activation, limited diffusion and high abruptness needed for junctions in the sub-65nm regime. This paper will provide an overview of the technology including the motivation, technology and some process results. Both main approaches for MSA, sub-melt laser and flash lamp annealing will be discussed as well as the potential challenges to bring these technologies into mainstream manufacturing.

Info:

Periodical:

Materials Science Forum (Volumes 573-574)

Edited by:

W. Lerch and J. Niess

Pages:

257-267

DOI:

10.4028/www.scientific.net/MSF.573-574.257

Citation:

J. C. Gelpey et al., "An Overview of ms Annealing for Deep Sub-Micron Activation", Materials Science Forum, Vols. 573-574, pp. 257-267, 2008

Online since:

March 2008

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Price:

$35.00

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