An Overview of ms Annealing for Deep Sub-Micron Activation
Millisecond annealing (MSA) has been developed over the last several years as a viable approach to achieve the high electrical activation, limited diffusion and high abruptness needed for junctions in the sub-65nm regime. This paper will provide an overview of the technology including the motivation, technology and some process results. Both main approaches for MSA, sub-melt laser and flash lamp annealing will be discussed as well as the potential challenges to bring these technologies into mainstream manufacturing.
W. Lerch and J. Niess
J. C. Gelpey et al., "An Overview of ms Annealing for Deep Sub-Micron Activation", Materials Science Forum, Vols. 573-574, pp. 257-267, 2008