Research on Influence of Ion-Assisted Deposition to the Optical and Mechanical Properties of SiO2 Film

Duo Shu Wang; Chong Tai Luo; Tao Chen; Yu Qing Xiong; Ji Zhou Wang

doi:10.4028/www.scientific.net/MSF.654-656.1720

Paper Titles

Constrains of Super-Current Flow in YBCO Coated Conductors
p.1704

Study of Deposition of Aluminum Nitride Thin Films by Hollow Cathode Electron Beam Vapor Deposition Method
p.1708

Synthesis and Its Characteristic of Silicon Nitride Film Deposited by ECR-PECVD at Low Temperature
p.1712

Effect of Nitridation on GaN Film Grown on Glass Substrate by ECR-PEMOCVD Method
p.1716

Research on Influence of Ion-Assisted Deposition to the Optical and Mechanical Properties of SiO₂ Film
p.1720

Fabrication of Numerous Ferromagnetic Metal Nanowires Using Electrodeposition Technique
p.1724

Fabrication of Co/Cu Multilayered Nanowires Using a Pulsed Current Deposition Technique
p.1728

Electrodeposition of ZnTe Compound Semiconductors from Aqueous Solution
p.1732

The Effect of Cobalt Addition on Structural and Magnetic Properties of Electrodeposited Iron-Platinum Nanocrystalline Thin Films
p.1736

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Research on Influence of Ion-Assisted Deposition to the Optical and Mechanical Properties of SiO₂ Film

Abstract:

In the paper, ion-assisted e-beam evaporation (IAEE) method was used to deposit SiO2 film on CBA(CaO-Al2O3-BaO) glass substrate, and the influence of processing parameters on the performance of the thin films was studied. The result shows that the ion energy, substrate temperature and evaporating rate are key factors that affect the abrasion resistance and transmission of the SiO2 film. Heat treatment was used to eliminate the absorption of H2O in spectrum range of 2.7~3.5μm. SiO2 film with good abrasion resistance and high transmission in spectrum range 3.0~5.0μm was deposited successfully on the special glass substrate.