Research on Influence of Ion-Assisted Deposition to the Optical and Mechanical Properties of SiO2 Film

Abstract:

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In the paper, ion-assisted e-beam evaporation (IAEE) method was used to deposit SiO2 film on CBA(CaO-Al2O3-BaO) glass substrate, and the influence of processing parameters on the performance of the thin films was studied. The result shows that the ion energy, substrate temperature and evaporating rate are key factors that affect the abrasion resistance and transmission of the SiO2 film. Heat treatment was used to eliminate the absorption of H2O in spectrum range of 2.7~3.5μm. SiO2 film with good abrasion resistance and high transmission in spectrum range 3.0~5.0μm was deposited successfully on the special glass substrate.

Info:

Periodical:

Materials Science Forum (Volumes 654-656)

Main Theme:

Edited by:

Jian-Feng Nie and Allan Morton

Pages:

1720-1723

DOI:

10.4028/www.scientific.net/MSF.654-656.1720

Citation:

D. S. Wang et al., "Research on Influence of Ion-Assisted Deposition to the Optical and Mechanical Properties of SiO2 Film ", Materials Science Forum, Vols. 654-656, pp. 1720-1723, 2010

Online since:

June 2010

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Price:

$35.00

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