Fabrication of Co/Cu Multilayered Nanowires Using a Pulsed Current Deposition Technique

Takeshi Ohgai; Keisuke Hashiguchi; Takao Morimura; Keizo Takao; Akio Kagawa

doi:10.4028/www.scientific.net/MSF.654-656.1728

Paper Titles

Synthesis and Its Characteristic of Silicon Nitride Film Deposited by ECR-PECVD at Low Temperature
p.1712

Effect of Nitridation on GaN Film Grown on Glass Substrate by ECR-PEMOCVD Method
p.1716

Research on Influence of Ion-Assisted Deposition to the Optical and Mechanical Properties of SiO₂ Film
p.1720

Fabrication of Numerous Ferromagnetic Metal Nanowires Using Electrodeposition Technique
p.1724

Fabrication of Co/Cu Multilayered Nanowires Using a Pulsed Current Deposition Technique
p.1728

Electrodeposition of ZnTe Compound Semiconductors from Aqueous Solution
p.1732

The Effect of Cobalt Addition on Structural and Magnetic Properties of Electrodeposited Iron-Platinum Nanocrystalline Thin Films
p.1736

Deposition of GaN Films on Freestanding CVD Thick Diamond Films
p.1740

The Preparation for Cu(Sn) Films of Barrierless Interconnection
p.1744

HomeMaterials Science ForumMaterials Science Forum Vols. 654-656Fabrication of Co/Cu Multilayered Nanowires Using...

Fabrication of Co/Cu Multilayered Nanowires Using a Pulsed Current Deposition Technique

Abstract:

Co/Cu multilayered nanowires with 40 nm in diameter were fabricated using a pulsed current deposition technique into a nanoporous template with numerous nanochannels. To determine the optimum electrodeposition condition of Cu and Co into the template, cathodic polarization behavior was examined at a wide range of cathode potential. Time-dependence of deposition current was monitored to determine the growth rate of Co and Cu nanowires. Co layer and Cu layer thicknesses were adjusted to several tens nanometers, by controlling the deposition times. With decreasing the each layer thickness, the coercive force of Co/Cu multilayered nanowires was decreased and the soft magnetic property was improved.

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Materials Science Forum (Volumes 654-656)

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1728-1731

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.654-656.1728

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Online since:

June 2010

Authors:

Takeshi Ohgai, Keisuke Hashiguchi, Takao Morimura, Keizo Takao, Akio Kagawa

Keywords:

Electro-Deposition, Membrane, Multilayer, Nanochannel, Nanowire

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