[1]
A. Schöner, M. Krieger, G. Pensl, M. Abe, H. Nagasawa, Fabrication and characterization of 3C-SiC-based MOSFETs, Chem. Vap. Deposition 12 (2006) 523-530.
DOI: 10.1002/cvde.200606467
Google Scholar
[2]
T. Ohshima, K. K. Lee, Y. Ishida, K. Kojima, Y. Tanaka, T. Takahashi, M. Yoshikawa, H. Okumura, K. Arai, T. Kamiya, The electrical characteristics of metal-oxide-semiconductor field effect transistors fabricated on cubic silicon carbide, Jpn. J. Appl. Phys. 42 (2003).
DOI: 10.1143/jjap.42.l625
Google Scholar
[3]
H. Nagasawa, K. Yagi, T. Kawahara, N. Hatta, Reducing planar defects in 3C-SiC , Chem. Vap. Deposition 12 (2006) 502-508.
DOI: 10.1002/cvde.200506466
Google Scholar
[4]
A.A. Lebedev, V.V. Zelenin, P.L. Abramov, E.V. Bogdanova, S.P. Lebedev, D.K. Nel'son, B.S. Razbirin, M.P. Scheglov, A.S. Tregubova, M. Syväjärvi, R. Yakimova, Growth and study of thick 3C-SiC epitaxial layers produced by epitaxy on 6H-SiC substrates, Mater. Sci. Forum 556-557 (2007).
DOI: 10.4028/www.scientific.net/msf.556-557.175
Google Scholar
[5]
M. Syväjärvi, R. Yakimova, H. Jacobsson, E. Janzén, Growth of 3C-SiC using off-oriented 6H-SiC substrates, Mater. Sci. Forum 353-356 (2001) 143-146.
DOI: 10.4028/www.scientific.net/msf.353-356.143
Google Scholar
[6]
D. Chaussende, J. Eid, F. Mercier, R. Madar, M. Pons, Nucleation and growth of 3C-SiC single crystals from the vapor phase, Mater. Sci. Forum 615-617 (2009) 31-36.
DOI: 10.4028/www.scientific.net/msf.615-617.31
Google Scholar
[7]
M. Soueidan, G. Ferro, A vapor-liquid-solid mechanism for growing 3C-SiC single-domain layers on 6H-SiC (0001), Adv. Funct. Mater. 16 (2006) 975-979.
DOI: 10.1002/adfm.200500597
Google Scholar
[8]
T. Ujihara, K. Seki, R. Tanaka, S. Kozawa, Alexander, K. Morimoto, K. Sasaki, Y. Takeda, High-quality and large-area 3C-SiC growth on 6H–SiC(0001) seed crystal with top-seeded solution growth, J. Cryst. Growth 318 (2011) 389-393.
DOI: 10.1016/j.jcrysgro.2010.10.148
Google Scholar
[9]
K. Seki, Alexander, S. Kozawa, T. Ujihara, P. Chaudouët, D. Chaussende, Y. Takeda, Formation process of 3C-SiC on 6H-SiC (0001) by low-temperature solution growth in Si–Sc–C system, J. Cryst. Growth 335 (2011) 94-99.
DOI: 10.1016/j.jcrysgro.2011.09.004
Google Scholar
[10]
K. Seki, Alexander, S. Kozawa, S. Harada, T. Ujihara, Y. Takeda, Polytype-selective growth of SiC by supersaturation control in solution growth, J. Cryst. Growth 360 (2012) 176-180.
DOI: 10.1016/j.jcrysgro.2011.11.041
Google Scholar
[11]
T. Kimoto, A. Itoh, H. Matsunami, Step-controlled epitaxial growth of high-quality SiC layers, Phys. Stat. Sol. (b) 202 (1997) 247-262.
DOI: 10.1002/1521-3951(199707)202:1<247::aid-pssb247>3.0.co;2-q
Google Scholar
[12]
M. Soueidan, G. Ferro, O. Kim-Hak, F. Cauwet, B. Nsouli, Vapor-liquid-solid growth of 3C-SiC on alpha-SiC substrates 1. Growth mechanism, Cryst. Growth Des. 8 (2008) 1044-1050.
DOI: 10.1021/cg070499+
Google Scholar
[13]
J. Eriksson, M. H. Weng, F. Roccaforte, F. Giannazzo, S. Leone, V. Raineri, Toward an ideal Schottky barrier on 3C-SiC, Appl. Phys. Lett. 95 (2009) 081907-1-3.
DOI: 10.1063/1.3211965
Google Scholar
[14]
K. Nishino, T. Kimoto, H. Matsunami, Reduction of double positioning twinning in 3C-SiC grown on α-SiC substrates, Jpn. J. Appl, Phys. 36 (1997) 5202-5207.
DOI: 10.1143/jjap.36.5202
Google Scholar
[15]
K. Kusunoki, K. Kamei, N. Yashiro, T. Tanaka, A. Yauchi, Solution growth of 3C-SiC using Si solvent under N2-He atomosphere, Mater. Sci. Forum 600-603 (2009) 187-190.
DOI: 10.4028/www.scientific.net/msf.600-603.187
Google Scholar