The Effect of Modified Crucible Design and Seed Attachment on SiC Crystal Grown by PVT

Article Preview

Abstract:

The present research was focused to investigate the effect of internal crucible design that influenced the 4H-SiC crystal growth onto a 6H-SiC seed by PVT method. The crucible design was modified to produce a uniform radial temperature gradient in the growth cell. The seed attachment was also modified with a use of polycrystalline SiC plate. The crystal quality of 4H-SiC single crystals grown in modified crucible and grown with modified seed attachment was revealed to be better than that of crystal grown in conventional crucible. The full width at half maximum (FWHM) values of grown SiC crystals in the conventional crucible, the modified seed attachment and the modified crucible were 285 arcsec, 134 arcsec and 128 arcsec, respectively. The micropipe density (MPD) of grown SiC crystals in the conventional crucible, the modified seed attachment and the modified crucible were 101ea/cm^2, 81ea/cm^2 and 42ea/cm^2, respectively.

You might also be interested in these eBooks

Info:

Periodical:

Materials Science Forum (Volumes 740-742)

Pages:

77-80

Citation:

Online since:

January 2013

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2013 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] R. Madar, Nature 430 (2004) 974.

Google Scholar

[2] D. Nakamura, I. Gunjishima, S. Yamaguchi, T. Ito, A. Okamoto, Nature 430 (2004) 1009.

Google Scholar

[3] A. Gupta, E. Semenas, E. Emorhokpor, J. Chen, Mater. Sci. Forum 527–529 (2006) 43.

Google Scholar

[4] M. Nakabayashi, T. Fujimoto, M. Katsuno, N. Ohtani, H. Tsuge, H. Yashiro, T. Aigo, T. Hoshino, H. Hirano, K. Tatsumi, Mater. Sci. Forum 600–603 (2009) 3.

DOI: 10.4028/www.scientific.net/msf.600-603.3

Google Scholar

[5] R. Yakimova, M. Syväjärvi, M. Tuominen, T. Iakimov, Mater. Sci. Eng. B61–62 (1999) 54.

Google Scholar

[6] N. Schulze, D. L. Barrett, G. Pensl, S. Rohmfeld, Mater. Sci. Eng. B 61–62 (1999) 44.

Google Scholar

[7] H. J. Rost, M. Schmidbauer, D. Siche, R. Fornari, J. Cryst. Growth 290 (2006) 137.

Google Scholar

[8] J. Takahashi, N. Ohtani, Phys. Status Solidi B 202 (1997) 163.

Google Scholar

[9] S. Nishino. Y. Kojima and J. Saraie, Springer proceeding in Physics, Amorphous and Crystalline Silicon Carbide Ⅲ, 56, 15 edited by G. L. Harris, M. G. Spencer, C. Yang (Springer-Verlang, New York, 1992).

DOI: 10.1007/978-3-642-84402-7_2

Google Scholar

[10] R. Weingartner, P.J. Wellmann, M. Bickermann, D. Hofmann, T.L. Straubinger and A. Winnacker, Appl. Phys. Lett. 80(1) (2002) 70.

Google Scholar