Microstructure Characterization of Si/C Multilayer Thin Films

Abstract:

Si/C multilayer thin films were prepared by magnetron sputtering and post-annealing in N₂ atmosphere at 1100 for 1h. X-ray diffraction (XRD), Raman scattering and high-resolution transmission electron microscopy (HRTEM) were applied to study the microstructures of the thin films. For the case of Si/C modulation ratio smaller than 1,interlayer diffusion is evident, which promotes the formation of α-SiC during thermal annealing. If the modulation ratio is larger than 1, the Si sublayers are partially crystallized, and the thicker the Si sublayers are, the crystallinity increases. To be excited, brick-shaped nc-Si is directly observed by HRTEM. The brick-shaped nc-Si appears to be more regular near the Si (100) substrate but with twin defects. The results are instructive in the application of solar cells.

• Periodical: Materials Science Forum (Volumes 743-744)
• Pages: 910-914
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.743-744.910
• Online since: January 2013
• Authors: Ting Han, Geng Rong Chang, Yun Jin Sun, Fei Ma, Ke Wei Xu
• Keywords: Magnetron Sputtering, Microstructure, Modulation Ratio, Si/C Mutilayer, Solar Cell

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