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HomeMaterials Science ForumMaterials Science Forum Vol. 815Investigation of Chemical Vapor Deposited Graphene...

Investigation of Chemical Vapor Deposited Graphene Film on Oxide Substrate

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Abstract:

Graphene is a novel two dimensional material with exceptional properties. Chemical vapor deposition of graphene on metal substrates is widely used to prepare high quality graphene film. However, the graphene films need to be transferred to oxide substrates for device applications. A chemical vapor deposition approach for direct growth of graphene films on zinc oxide was demonstrated in the present investigation. Raman spectra were used to characterize the grown graphene films. The impact of the growth temperature, time and gas flow ratio on the layer number and crystallite size of graphene was investigated.

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Periodical:

Materials Science Forum (Volume 815)

Pages:

18-21

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.815.18

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Online since:

March 2015

Authors:

Tao Huang, Lin Chen*, Qing Qing Sun, Peng Zhou, David Wei Zhang

Keywords:

Chemical Vapor Deposition (CVD), Graphene Growth, Oxide Substrates

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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