Process Control of Buried Layer Epitaxy by Barrel Type Furnace

Yin Hai Wang; Jian Jun Zhao; Hong Luo; Lin Bao Ma

doi:10.4028/www.scientific.net/MSF.815.3

Paper Titles

Preface

Process Control of Buried Layer Epitaxy by Barrel Type Furnace
p.3

Ru Thin Film Formation Using Oxygen Plasma Enhanced ALD and Rapid Thermal Processing
p.8

Research on Surface Roughness of Acid Etched Silicon Wafers
p.14

Investigation of Chemical Vapor Deposited Graphene Film on Oxide Substrate
p.18

Ultrahigh Purity Copper Alloy Target Used Innanoscale ULSI Interconnects
p.22

Property of an AlGaN/GaN MIS Diode with Si₃N₄/Al₂O₃ Bilayer Gate Dielectric Films
p.30

A New Type of Self-Aligned Technology for RF and Microwave Graphene Field-Effect Transistors
p.36

Electron Beam Annealing for Component Optimization in Si-Sb-Te Material
p.44

HomeMaterials Science ForumMaterials Science Forum Vol. 815Process Control of Buried Layer Epitaxy by Barrel...

Process Control of Buried Layer Epitaxy by Barrel Type Furnace

Abstract:

Though the quality of epitaxial wafer prepared by barrel type epitaxial furnace is inferior to that by traditional single wafer furnace, it has a series of advantages such as high yield and low cost. The key issues and difficulties of the epitaxy process for buried layers IC wafers prepared by barrel type epitaxial furnace were discussed. By optimizing the epitaxy process parameters and tightly controlling the production procedure such as cleaning and inspecting, barrel type epitaxial furnace can meet the special requirement for buried layer epitaxial process. The characteristics of the epilayers prepared by barrel type epitaxial furnace were close or equivalent to that by single wafer furnace. The ways to suppress the auto doping in the double buried layer epitaxial process were introduced. The ideal transition width of the epilayers was obtained by the two-step epitaxy.

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Periodical:

Materials Science Forum (Volume 815)

Pages:

3-7

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.815.3

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Online since:

March 2015

Authors:

Yin Hai Wang*, Jian Jun Zhao, Hong Luo, Lin Bao Ma

Keywords:

Barrel Type Epitaxy, Buried Layer Epitaxy, Process Control, Two-Step Epitaxy

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