Structure, Composition and Adhesion Strength of Hf Coatings Deposited on Mo Substrate by Ion Beam Sputtering

Qin Li Lv; Jian Gao; Tao Li; Zhi Yuan Liu

doi:10.4028/www.scientific.net/MSF.852.1108

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Effect of Assisted-Ion-Beam Gases on the Structure of Amorphous Silicon Thin Films Prepared by Ion-Beam-Assisted Sputtering
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Structure, Composition and Adhesion Strength of Hf Coatings Deposited on Mo Substrate by Ion Beam Sputtering
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HomeMaterials Science ForumMaterials Science Forum Vol. 852Structure, Composition and Adhesion Strength of Hf...

Structure, Composition and Adhesion Strength of Hf Coatings Deposited on Mo Substrate by Ion Beam Sputtering

Abstract:

Hafnium films were prepared on the molybdenum substrate at room temperature by ion beam assisted deposition (IBAD) and post-annealing was conducted to know their status under high temperature. The structure and composition of Hf coatings were confirmed by XRD, STEM and EDX, respectively. The adhesion strength between the coating and the substrate was evaluated by a nanoscratch tester. The results show that some dilution occurs at the coating/substrate interface and that Mo combines with Hf to form a HfMo₂ alloy after high temperature annealing. The adhesive force of the Hf coating was increased from 120 mN to 160 mN after annealing.