Fabrication of 100nm Sized Patterns on a Non-Planar Substrate by Using Nanoimprinting Lithography

Abstract:

A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

• Periodical: Solid State Phenomena (Volumes 121-123)
• Pages: 665-668
• DOI: https://doi.org/10.4028/www.scientific.net/SSP.121-123.665
• Online since: March 2007
• Authors: Heon Lee, Joo Youl Huh, Ki Yeon Yang, Sung Hoon Hong, Gun Young Jung
• Keywords: Flexible Template, Nanoimprint Lithography, Nano-Pattern Duplication, Polymer Template, Thermally Curable Monomer Resin, UV Curable Monomer Resin

References

[1] H. Lee and G-Y Jung: Japanese Journal of Applied Physics Vol. 43 (2004), p.8369.

[2] C. D. Schaper, Nano Letters Vol. 3 (2003), p.1305.

[3] H. Lee and G-Y Jung: Microelectronic Engineering Vol. 77 (2005), p.168.

[4] H. Lee and G-Y Jung: Microelectronic Engineering Vol. 77 (2005), p.42 flexible polymer stamp imprinted pattern 5μm.