Fabrication of 100nm Sized Patterns on a Non-Planar Substrate by Using Nanoimprinting Lithography

Abstract:

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A faithful pattern transferring onto a non-planar substrate was demonstrated by nano-imprinting technique. Uniform pressing of a flexible template onto a substrate was important for the faithful pattern transferring. Both the UV-based and thermal imprinting techniques were used to transfer patterns of 200nm sized features to the non-planar substrates such as outer wall of rod and inner surface of cylinder and it could be used for nano-devices such as lab on a chip.

Info:

Periodical:

Solid State Phenomena (Volumes 121-123)

Edited by:

Chunli BAI, Sishen XIE, Xing ZHU

Pages:

665-668

DOI:

10.4028/www.scientific.net/SSP.121-123.665

Citation:

H. Lee et al., "Fabrication of 100nm Sized Patterns on a Non-Planar Substrate by Using Nanoimprinting Lithography", Solid State Phenomena, Vols. 121-123, pp. 665-668, 2007

Online since:

March 2007

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Price:

$35.00

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