Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template

Heon Lee; Ki Yeon Yang; Sung Hoon Hong; C.D. Schaper; Gun Young Jung

doi:10.4028/www.scientific.net/SSP.121-123.661

Paper Titles

The Resonant Tunneling in Si_1-xGe_x/Si Superlattices
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The Effect of Substrate Deformation in UV-Nanoimprint Lithography Using a Large Area Stamp
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The Micro-Patterning of Polymer in the Presence of Porphyrin via Electrospinning
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Fabrication of 100nm Sized Patterns on Flexible Polyethylene-Terephthalate Substrate Using Monomer Based Thermal Curing Nanoimprint Lithography
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Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template
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Fabrication of 100nm Sized Patterns on a Non-Planar Substrate by Using Nanoimprinting Lithography
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Realization of Silicon Nitride Template for Nanoimprint: A First Result
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Heat-Transfer Mechanism of Sample-Probe in Variable-Temperature Scanning Probe Microscope and Influence of Temperature on Tunneling Current
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Design and Simulation of a Mid-Infrared Quantum Cascade Laser Based on Ge-Si Superlattices
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Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template

Abstract:

Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.