Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template

Abstract:

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Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.

Info:

Periodical:

Solid State Phenomena (Volumes 121-123)

Edited by:

Chunli BAI, Sishen XIE, Xing ZHU

Pages:

661-664

DOI:

10.4028/www.scientific.net/SSP.121-123.661

Citation:

H. Lee et al., "Nano-Imprint Lithography of 100nm Sized Patterns Using Water Soluble PVA, Poly(Vinyl Alcohol), Template", Solid State Phenomena, Vols. 121-123, pp. 661-664, 2007

Online since:

March 2007

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Price:

$35.00

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