Electronic Properties Carbon Film Using Chemical Process
Electro-deposition of carbon film on silicon substrate in methanol solution was carried out with various current density, solution temperature and electrode spacing between anode and cathode. The carbon films with smooth surface morphology and high electrical resistance were formed when the distance between electrode was relatively wider. The electrical resistance of the carbon films were independent of both current density and solution temperature.
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
S. H. Lee "Electronic Properties Carbon Film Using Chemical Process", Solid State Phenomena, Vols. 124-126, pp. 251-254, 2007