Electronic Properties Carbon Film Using Chemical Process

Abstract:

Article Preview

Electro-deposition of carbon film on silicon substrate in methanol solution was carried out with various current density, solution temperature and electrode spacing between anode and cathode. The carbon films with smooth surface morphology and high electrical resistance were formed when the distance between electrode was relatively wider. The electrical resistance of the carbon films were independent of both current density and solution temperature.

Info:

Periodical:

Solid State Phenomena (Volumes 124-126)

Edited by:

Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park

Pages:

251-254

DOI:

10.4028/www.scientific.net/SSP.124-126.251

Citation:

S. H. Lee "Electronic Properties Carbon Film Using Chemical Process", Solid State Phenomena, Vols. 124-126, pp. 251-254, 2007

Online since:

June 2007

Authors:

Keywords:

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.