The Influence of Standing Waves on Cleaning with a Megasonic Nozzle

Tom Janssens; G. Doumen; S. Halder; Kurt Wostyn; Paul W. Mertens; Joachim Straka

doi:10.4028/www.scientific.net/SSP.145-146.23

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Impact of Megasonic Activation with Different Chemistries on Silicon Surface in Single Wafer Tool
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Impacts of Ionization Potentials and Megasonic Dispersion
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Removal of Nano-Particles by Aerosol Spray: Effect of Droplet Size and Velocity on Cleaning Performance
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High Aspect Ratio Contact Clean Study in 58nm Flash Device
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High Velocity Aerosol Cleaning with Organic Solvents: Particle Removal and Substrate Damage
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The Influence of Standing Waves on Cleaning with a Megasonic Nozzle

Abstract:

A non uniform sound field distribution can be a problem in a megasonic cleaning system, since a higher sound intensity can cause damage, while areas exposed to a lower intensity will be insufficiently cleaned. These non uniformities can be the result of sound field reflection, leading to standing waves, and the interference related to the near field. In a single wafer tool with a transducer facing the wafer a small height difference will have a large impact on the cleaning efficiency if standing waves are present. Here we study the impact of the wafer transducer height in a cleaning system using a megasonic nozzle above a rotating wafer.