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HomeSolid State PhenomenaSolid State Phenomena Vols. 145-146Megasonic Sweeping and Silicon Wafer Cleaning

Megasonic Sweeping and Silicon Wafer Cleaning

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Ultra Clean Processing of Semiconductor Surfaces IX

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Periodical:

Solid State Phenomena (Volumes 145-146)

Pages:

27-30

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.145-146.27

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Cite this paper

Online since:

January 2009

Authors:

J.M. Goodson, R. Nagarajan

Keywords:

Cleaning, Contamination Control, Megasonic, Particle Count, Sweep, Wafer Processing

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© 2009 Trans Tech Publications Ltd. All Rights Reserved

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