Characterization of Surface Metal Contaminations on Fused Quartz

Abstract:

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Micro-contamination exerts ever-increasing adverse impact on semiconductor manufacturing as device integration scale keeps increasing and device geometry continues decreasing. In particular, contaminations from particles, trace metals, and/or organic compounds can reduce device yield, quality, and reliability [. Metallic impurities from materials used for process equipment are one of the major contamination sources.

Info:

Periodical:

Solid State Phenomena (Volume 195)

Edited by:

Paul Mertens, Marc Meuris and Marc Heyns

Pages:

277-279

DOI:

10.4028/www.scientific.net/SSP.195.277

Citation:

S. Liu, B. Liu, "Characterization of Surface Metal Contaminations on Fused Quartz", Solid State Phenomena, Vol. 195, pp. 277-279, 2013

Online since:

December 2012

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$35.00

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