The Impact of Dislocation Structure on Impurity Decoration of Dislocation Clusters in Multicrystalline Silicon

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Abstract:

Light microscopy, electron backscatter diffraction and transmission electron microscopy is employed to investigate dislocation structure and impurity precipitation in commonly occurring dislocation clusters as observed on defect-etched directionally solidified multicrystalline silicon wafers. The investigation shows that poligonised structures consist of parallel mostly similar, straight, well-ordered dislocations, with minimal contact-interaction and no evidence of precipitate decoration. On the other hand, disordered structures consist of various dislocation types, with interactions being common. Decoration of dislocations by second phase particles is observed in some cases. Enhanced recombination activity of dislocations may therefore be a result of dislocation interaction forming tangles, microscopic kinks and jogs, which can serve as heterogeneous nucleation sites that enhance metallic decoration.

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Solid State Phenomena (Volumes 205-206)

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71-76

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October 2013

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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[1] D.M. Powell, M.T. Winkler, H. Choi, C.B. Simmons, D.B. Needleman, T. Buonassisi, Energy & Environmental Science, 5 (2012) 5874-5883.

Google Scholar

[2] D.M. Powell, M.T. Winkler, A. Goodrich, T. Buonassisi, IEEE Journal of Photovoltaics, 3, No. 2, (2013) 662 - 668.

Google Scholar

[3] M. Schmela, Photon International, 3 (2012) 132 - 142.

Google Scholar

[4] C. Donolato, Journal of Applied Physics, 84 (1998) 2656-2664.

Google Scholar

[5] T. Kieliba, S. Riepe, W. Warta, Journal of Applied Physics, 100 (2006) 063706-063712.

Google Scholar

[6] J.R. Davis, Jr., A. Rohatgi, R.H. Hopkins, P.D. Blais, P. Rai-Choudhury, J.R. McCormick, H.C. Mollenkopf, IEEE Transactions on Electron Devices, 27 (1980) 677-687.

DOI: 10.1109/t-ed.1980.19922

Google Scholar

[7] M. Rinio, A. Yodyungyong, S. Keipert-Colberg, D. Borchert, A. Montesdeoca-Santana, physica status solidi (a), 208 (2011) 760-768.

DOI: 10.1002/pssa.201084022

Google Scholar

[8] S. Kusanagi, T. Sekiguchi, B. Shen, K. Sumino, Materials Science and Technology, 11 (1995) 682-690.

Google Scholar

[9] M.I. Bertoni, D.P. Fenning, M. Rinio, V. Rose, M. Holt, J. Maser, T. Buonassisi, Energy & Environmental Science, 4 (2011) 4252-4257.

DOI: 10.1039/c1ee02083h

Google Scholar

[10] B.L. Sopori, Journal of The Electrochemical Society, 131 (1984) 667-672.

Google Scholar

[11] W.C. Dash, Journal of Applied Physics, 27 (1956) 1193-1195.

Google Scholar

[12] H. Klapper, Generation and Propagation of Defects During Crystal Growth, in: Springer Handbook of Crystal Growth, Springer, 2010, pp.93-132.

DOI: 10.1007/978-3-540-74761-1_4

Google Scholar

[13] M.M. Kivambe, G. Stokkan, T. Ervik, B. Ryningen, O. Lohne, Journal of Applied Physics, 110 (2011) 063524.

DOI: 10.1063/1.3641978

Google Scholar

[14] T. Ervik, M. Kivambe, G. Stokkan, B. Ryningen, O. Lohne, Acta Materialia, 60 (2012) 6762-6769.

DOI: 10.1016/j.actamat.2012.08.049

Google Scholar

[15] M.J. Süess, E. Mueller, R. Wepf, Ultramicroscopy, 111 (2011) 1224-1232.

DOI: 10.1016/j.ultramic.2011.03.004

Google Scholar

[16] F. Louchet, A. George, Journal De Physique, 4, (1983) C4, 51-60.

Google Scholar

[17] I. Takahashi, N. Usami, K. Kutsukake, G. Stokkan, K. Morishita, K. Nakajima, Journal of Crystal Growth, 312 (2010) 897-901.

DOI: 10.1016/j.jcrysgro.2010.01.011

Google Scholar

[18] B. Ryningen, G. Stokkan, M. Kivambe, T. Ervik, O. Lohne, Acta Materialia, 59 (2011) 7703-7710.

DOI: 10.1016/j.actamat.2011.09.002

Google Scholar

[19] T. Ervik, M. Kivambe, G. Stokkan, B. Ryningen, O. Lohne, in: 26th European Photovoltaic Solar Energy Conference and Exhibition, Code 2BV. 4. 31, Hamburg, Germany, 2011, pp.1895-1899.

Google Scholar

[20] M. Kivambe, G. Stokkan, T. Ervik, B. Ryningen, O. Lohne, Solid State Phenomena, 178 (2011) 307-312.

DOI: 10.4028/www.scientific.net/ssp.178-179.307

Google Scholar

[21] M.M. Kivambe, T. Ervik, B. Ryningen, G. Stokkan, Journal of Applied Physics, 112 (2012) 103528-103526.

DOI: 10.1063/1.4767062

Google Scholar

[22] J.R. Patel, Journal of Applied Physics, 29 (1958) 170-176.

Google Scholar