Wafer Container Monitoring Concerning Airborne Molecular Contaminations along a 300 mm Power Semiconductor Production Flow

Peter Franze; Germar Schneider; Stefan Kaskel

doi:10.4028/www.scientific.net/SSP.314.41

Paper Titles

Direct Analysis of Ultra Trace Metallic Particles in NH₃ and HCl Gases by Gas Exchange Device (GED)-ICP-MS
p.17

Investigation of Contaminants in Single Wafer Wet Cleaning Using Isopropyl Alcohol
p.23

Cl-Containing Microplastics from the Environment
p.29

Experimental Wafer Carrier Contamination Analysis and Monitoring in Fully Automated 300 mm Power Production Lines
p.34

Wafer Container Monitoring Concerning Airborne Molecular Contaminations along a 300 mm Power Semiconductor Production Flow
p.41

Towards Si-Cap-Free SiGe Passivation: Impact of Surface Preparation on Low-Pressure Oxidation of SiGe
p.49

Wet Chemical Cleaning of Organosilane Monolayers
p.54

Reaction Kinetics of Poly-Si Etching in TMAH Solution
p.60

Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H₂O₂ Solutions
p.66

HomeSolid State PhenomenaSolid State Phenomena Vol. 314Wafer Container Monitoring Concerning Airborne...

Wafer Container Monitoring Concerning Airborne Molecular Contaminations along a 300 mm Power Semiconductor Production Flow

Abstract:

The focus of the study was to understand the behavior of airborne molecular contaminations (AMC) within the 300 mm wafer containers called front-opening unified pods (FOUPs) in a high-volume fabrication facility for power semiconductors of Infineon Technologies Dresden. A main goal was to implement new concepts and strategies to prevent the different power semiconductors from any yield losses driven by AMC. It could be shown, that there is a strong dependency of the concentration and the type of the determined contaminations on the investigated process steps.

By email View Pdf

You might also be interested in these eBooks

Ultra Clean Processing of Semiconductor Surfaces XV

View Preview

Info:

Periodical:

Solid State Phenomena (Volume 314)

Pages:

41-46

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.314.41

Citation:

Cite this paper

Online since:

February 2021

Authors:

Peter Franze*, Germar Schneider, Stefan Kaskel

Keywords:

Airborne Molecular Contamination, AMC, Chemical Analysis, CRDS, Electrochemical Conductivity Measurements, FOUP, FOUP Management, Mass Spectroscopy, Power Semiconductors

Export:

RIS, BibTeX

Permissions:

Creative Commons CC BY 4.0

Citation:

* - Corresponding Author

References

[1] G. Schneider, T. Wagner, M. Kraft, 2015. Use of simulation studies to overcome key challenges in the fab automation of a 300 mm power semiconductor pilot line comprising thin-wafer processing. In: 2015 16th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), Saratoga Springs, NY, USA, 3-6 May 2015. New York: IEEE.

DOI: 10.1109/asmc.2015.7164448

Google Scholar

[2] G. Schneider, et al., 2016. Contamination control for wafer container used within 300 mm manufacturing for power microelectronics. Solid State Phenomena, 255, p.381.

DOI: 10.4028/www.scientific.net/ssp.255.381

Google Scholar

[3] I.-K. Lin, H. Bai, B.-J. Wu, 2009. Surface deposition of ionic contaminants on silicon wafers in a cleanroom environment. IEEE Transactions on Semiconductor Manufacturing, 22 (2), p.321.

DOI: 10.1109/tsm.2009.2017654

Google Scholar

[4] International Technology Roadmap for Semiconductors, 2014. ITRS 2011 Edition. [online] Available at: <https://web.archive.org/web/20150110005856/ http://www.itrs.net/Links/ 2011ITRS/ Home2011.htm> [Accessed 3 December 2019].

Google Scholar

[5] Picarro Incorporated, Cavity Ring-Down Spectroscopy (CRDS). [online] Available through: <https://www.picarro.com/company/technology/crds> [Accessed 3 December 2019].

Google Scholar

[6] Honeywell Analytics, Honeywell Gas Book [e-book] Morristown, USA: Honeywell Analytics. Available through: <https://www.honeywellanalytics.com/~/media/ honeywell-analytics/documents/ english/11296_gas-book_v5_0413_lr_en.pdf?la=en> [Accessed 3 December 2019].

Google Scholar

[7] M. Keller, 2013. AMC: Luftgetragene chemische Kontaminationen. Lounges 2013/Vision Pharma 2013, Karlsruhe, Germany, 5-7 February 2013. Stuttgart: Fraunhofer IPA.

Google Scholar