Direct Analysis of Ultra Trace Metallic Particles in NH3 and HCl Gases by Gas Exchange Device (GED)-ICP-MS

Katsu Kawabata; Kohei Nishiguchi; Tatsu Ichinose

doi:10.4028/www.scientific.net/SSP.314.17

Paper Titles

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Direct Analysis of Ultra Trace Metallic Particles in NH₃ and HCl Gases by Gas Exchange Device (GED)-ICP-MS
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Cl-Containing Microplastics from the Environment
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Experimental Wafer Carrier Contamination Analysis and Monitoring in Fully Automated 300 mm Power Production Lines
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Direct Analysis of Ultra Trace Metallic Particles in NH₃ and HCl Gases by Gas Exchange Device (GED)-ICP-MS

Abstract:

Gas Exchange Device (GED) was integrated with Inductively Coupled Plasma Mass Spectrometry(ICP-MS) for analysis of metallic particles in NH3 and HCl gases used in semiconductormanufacturing. A single pg/kg (ppq) level of metallic impurities in these gases could be determinedwithout any sample preparation.

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Periodical:

Solid State Phenomena (Volume 314)

Pages:

17-22

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.314.17

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Online since:

February 2021

Authors:

Katsu Kawabata*, Kohei Nishiguchi, Tatsu Ichinose

Keywords:

GED, HCI, ICP-MS, Metallic Particle Analysis, NH₃

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* - Corresponding Author

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DOI: 10.1039/c3ja50044f

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