Preface
Past, Present, and Future of Semiconductor Cleaning Technology
p.3
p.3
Nanosheet-Based Transistor Architectures for Advanced CMOS Scaling: Wet Etch and Gas Phase Etch Challenges in Confined Spaces
p.8
p.8
On Gas-Phase Selective Dry Etching in 3D Inflections
p.14
p.14
SiGe Selective Etching to Enable Bottom and Middle Dielectric Isolations for Advanced Gate-All-Around FET Architecture
p.23
p.23
Selectivity Tuning by Peroxide Concentration for the Selective Etching of SiGe20 to Si and SiGe40 to SiGe20
p.29
p.29
Investigation of Selective Wet Etching of SiGe Substrates for High-Performance Device Manufacturing
p.34
p.34
Highly Selective Etching of SiGe to Si for GAAFET
p.40
p.40
Atomic Level Chemical and Structural Properties of Silicon Surface and Initial Stages of Oxidation
p.49
p.49
Preface
Abstract:
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Info:
Periodical:
Solid State Phenomena (Volume 346)
Online since:
August 2023
Сopyright:
© 2023 Trans Tech Publications Ltd. All Rights Reserved
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