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Reactive Plasma Processes for the Fabrication of Nano-Dimensional Semiconductor Devices
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HomeSolid State PhenomenaSolid State Phenomena Vol. 55Reactive Plasma Processes for the Fabrication of...

Reactive Plasma Processes for the Fabrication of Nano-Dimensional Semiconductor Devices

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Semiconductor Materials and Technology (ICSMT)

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Periodical:

Solid State Phenomena (Volume 55)

Pages:

167-173

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.55.167

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Online since:

August 1997

Authors:

U.S. Tandon

Keywords:

Active Species, Adhesion, Bias, Descum, Discharge, Etching, Glow, Grating, Ion Beam, Ion Milling, Magnetron, PECVD, Reactor, Residue, RIE, Sheath, Sputtering

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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