Reactive Plasma Processes for the Fabrication of Nano-Dimensional Semiconductor Devices

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Periodical:

Solid State Phenomena (Volume 55)

Edited by:

R.M. Mehra and P.C. Mathur

Pages:

167-173

DOI:

10.4028/www.scientific.net/SSP.55.167

Citation:

U.S. Tandon "Reactive Plasma Processes for the Fabrication of Nano-Dimensional Semiconductor Devices", Solid State Phenomena, Vol. 55, pp. 167-173, 1997

Online since:

August 1997

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$35.00

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