Polycrystalline Silicon Films Produced by Low Pressure Chemical Vapour Deposition for Microswitch Applications: The Stress as Dependent on Deposition Conditions, Doping Type, and Thermal Treatments

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Periodical:

Solid State Phenomena (Volumes 67-68)

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223-228

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Online since:

April 1999

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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