Polycrystalline Silicon Films Produced by Low Pressure Chemical Vapour Deposition for Microswitch Applications: The Stress as Dependent on Deposition Conditions, Doping Type, and Thermal Treatments

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Periodical:

Solid State Phenomena (Volumes 67-68)

Edited by:

J.H. Werner, H.P. Strunk, H.W. Schock

Pages:

223-228

DOI:

10.4028/www.scientific.net/SSP.67-68.223

Citation:

S. Lucas et al., "Polycrystalline Silicon Films Produced by Low Pressure Chemical Vapour Deposition for Microswitch Applications: The Stress as Dependent on Deposition Conditions, Doping Type, and Thermal Treatments", Solid State Phenomena, Vols. 67-68, pp. 223-228, 1999

Online since:

April 1999

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