Grain Boundary Location Control by Patterned Metal Film in Excimer Laser Crystallized Polysilicon
p.175
p.175
Characterisation of Excimer Laser Crystallised Polysilicon by X-Ray Diffraction and by Channeling Contrast in a Scanning Electron Microscope
p.181
p.181
Multicrystalline Silicon Thin Films: Laser Crystallization Conditions and Properties
p.187
p.187
Laser-Crystallized Polycrystalline Silicon on Glass for Photovoltaic Applications
p.193
p.193
Properties of Poly-Si Obtained by Solid Phase Crystallization of Differently Produced a:Si:H Thin Films
p.199
p.199
Transmission Electron Microscopy and Raman Analysis of the Crystallisation Process of a-Si on Glass for Low Seed Density
p.205
p.205
Fine-Crystalline Silicon Grown at Low Temperatures: Investigations by High-Resolution Microscopy
p.211
p.211
Study of Polysilicon Produced by Solid Phase Crystallization of Hydrogenated Amorphous Silicon Deposited at High Rate
p.217
p.217
Polycrystalline Silicon Films Produced by Low Pressure Chemical Vapour Deposition for Microswitch Applications: The Stress as Dependent on Deposition Conditions, Doping Type, and Thermal Treatments
p.223
p.223
Properties of Poly-Si Obtained by Solid Phase Crystallization of Differently Produced a:Si:H Thin Films
Abstract:
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Periodical:
Solid State Phenomena (Volumes 67-68)
Pages:
199-204
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Online since:
April 1999
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© 1999 Trans Tech Publications Ltd. All Rights Reserved
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