The Influence of Low-Energy Argon Implantation and Out-Diffusion Heat Treatments on Hydrogen Enhanced Thermal Donor Formation in P-Type Czochralski Silicon

Abstract:

Article Preview

Info:

Periodical:

Solid State Phenomena (Volumes 69-70)

Edited by:

H.G. Grimmeiss, L. Ask, M. Kleverman, M. Kittler and H. Richter

Pages:

409-416

DOI:

10.4028/www.scientific.net/SSP.69-70.409

Citation:

A. G. Ulyashin et al., "The Influence of Low-Energy Argon Implantation and Out-Diffusion Heat Treatments on Hydrogen Enhanced Thermal Donor Formation in P-Type Czochralski Silicon", Solid State Phenomena, Vols. 69-70, pp. 409-416, 1999

Online since:

August 1999

Export:

Price:

$35.00

In order to see related information, you need to Login.