Correlation between Intrinsic Stress Distribution and Crystallographic Defects Density Profile in Czochralski Silicon after CMOS Processing

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Periodical:

Solid State Phenomena (Volumes 69-70)

Edited by:

H.G. Grimmeiss, L. Ask, M. Kleverman, M. Kittler and H. Richter

Pages:

519-524

DOI:

10.4028/www.scientific.net/SSP.69-70.519

Citation:

T. Piotrowski and W. Jung, "Correlation between Intrinsic Stress Distribution and Crystallographic Defects Density Profile in Czochralski Silicon after CMOS Processing", Solid State Phenomena, Vols. 69-70, pp. 519-524, 1999

Online since:

August 1999

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$35.00

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