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HomeSolid State PhenomenaSolid State Phenomena Vols. 69-70Correlation between Intrinsic Stress Distribution...

Correlation between Intrinsic Stress Distribution and Crystallographic Defects Density Profile in Czochralski Silicon after CMOS Processing

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Gettering and Defect Engineering in Semiconductor Technology VIII

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Periodical:

Solid State Phenomena (Volumes 69-70)

Pages:

519-524

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.69-70.519

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Online since:

August 1999

Authors:

T. Piotrowski, W. Jung

Keywords:

CMOS Processes, Crystallographic Defects, Intrinsic Stress

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© 1999 Trans Tech Publications Ltd. All Rights Reserved

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