Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF4/Ar/H2 Glow Discharge Plasma

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Periodical:

Solid State Phenomena (Volumes 80-81)

Edited by:

O. Bonnaud, T. Mohammed-Brahim, H.P. Strunk and J.H. Werner

Pages:

237-242

DOI:

10.4028/www.scientific.net/SSP.80-81.237

Citation:

S. Kumar et al., "Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF4/Ar/H2 Glow Discharge Plasma", Solid State Phenomena, Vols. 80-81, pp. 237-242, 2001

Online since:

November 2001

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$35.00

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