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HomeSolid State PhenomenaSolid State Phenomena Vols. 80-81Highly Crystalline Intrinsic Microcrystalline...

Highly Crystalline Intrinsic Microcrystalline Silicon Films Using SiF₄/Ar/H₂ Glow Discharge Plasma

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Polycrystalline Semiconductors VI

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Periodical:

Solid State Phenomena (Volumes 80-81)

Pages:

237-242

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.80-81.237

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Online since:

November 2001

Authors:

Satyendra Kumar, R. Brenot, Billel Kalache, V. Tripathi, R. Vanderhaghen, B. Drevillon, Pere Roca i Cabarrocas

Keywords:

Microcrystalline Silicon, Plasma Deposition, Spectroscopic Ellipsometry (SE), Thin Film Transistor

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© 2001 Trans Tech Publications Ltd. All Rights Reserved

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