Paper Titles

Microcrystalline Silicon Thin-Films Grown by Plasma Enhanced Chemical Vapour Deposition - Growth Mechanisms and Grain Size Control
p.257

Self-Limiting Formation and Optical Properties of Hemispherical Grains of Microcrystalline Silicon on an Amorphous Silicon Film Surface
p.269

Low-Temperature Formation of Si-Nanocrystal Dots from Chlorinated Materials by Radio-Frequency Plasma-Enhanced Chemical Vapor Deposition and Optical Properties
p.275

Deposition and Characterization of Polycrystalline Silicon Thin-Films by Reactive Thermal Chemical Vapour Deposition at 450°C
p.281

Growth of Highly <100>-Oriented Crystalline Silicon Thin Films on Molybdenum by Pulsed DC Magnetron Sputtering
p.287

Characterization of Laser Ablated GaN/ZnO Bilayer on Si(111)
p.295

Role of Potential Barriers in Epitaxial Layers of Semi-Insulating GaN Layers
p.301

Characterization of Polycrystalline GaN Layers Grown on Alkali-Metal-Free Glass Substrates by Molecular-Beam Epitaxy Assisted by Electron Cyclotron Resonance Plasma
p.307

Properties of Polycrystalline Cu₂O Thin-Films Doped with N or Si as an Acceptor Dopant
p.313

HomeSolid State PhenomenaSolid State Phenomena Vol. 93Growth of Highly <100>-Oriented Crystalline...

Growth of Highly <100>-Oriented Crystalline Silicon Thin Films on Molybdenum by Pulsed DC Magnetron Sputtering

Article Preview

Abstract:

You might also be interested in these eBooks

Polycrystalline Semiconductors VII

Info:

Periodical:

Solid State Phenomena (Volume 93)

Pages:

287-294

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.93.287

Citation:

Cite this paper

Online since:

June 2003

Authors:

P. Reinig, F. Fenske, A. Schöpke, B. Selle, W. Fuhs, M. Nerding, Horst P. Strunk

Keywords:

Polycrystalline Silicon, Pulsed Sputtering, Silicide, Texture

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2003 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: