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Silicon Films Deposited by Low-Pressure Chemical Vapour Deposition for Microsystems

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Polycrystalline Semiconductors VII

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Periodical:

Solid State Phenomena (Volume 93)

Pages:

453-458

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.93.453

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Online since:

June 2003

Authors:

H. Mahfoz-Kotb, A.C. Salaün, T. Mohammed-Brahim, F. Bendriaa, F. Le Bihan, O. Bonnaud

Keywords:

Polycrystalline Silicon, Residual Stress, Suspended Gate Thin Film Transistor

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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