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HomeSolid State PhenomenaSolid State Phenomena Vol. 93Mechanisms Controlling Preferred Orientation of...

Mechanisms Controlling Preferred Orientation of Chemical Vapour Deposited Polycrystalline Films

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Polycrystalline Semiconductors VII

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Periodical:

Solid State Phenomena (Volume 93)

Pages:

411-418

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.93.411

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Online since:

June 2003

Authors:

Yuya Kajikawa, Suguru Noda, Hiroshi Komiyama

Keywords:

Chemical Vapor Deposition (CVD), Preferred Orientation, Silicon, Silicon Carbide (SiC), Texture

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© 2003 Trans Tech Publications Ltd. All Rights Reserved

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