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Diffusion in Silicon - 10 Years of Research
Subtitle:
10 Years of Research
Description:
This volume presents a thorough treatment of the subject, covering a full decade of progress in the understanding of Diffusion in Silicon.
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Info:
eBook:
ToC:
Editors:
Dr. David J. Fisher
THEMA:
TGM
BISAC:
TEC021000
Keywords:
Activation Energy, Arsenic, Biaxial Stresses, Boron, Deep Levels Transient Spectroscopy DLTS, Diffusion, Diffusion Constant, Divacancy, ECR Plasma CVD, Interstitial, Ion Implantation, Plasma Etching, Point Defect, Pseudopotentials, Self-Interstitial, Silicon, Tensile Stress, Transient Enhanced Diffusion TED, Trap-Limited Migration, Vacancy
Pages:
560
Year:
1998
ISBN-13 (softcover):
9783908450290
ISBN-13 (CD):
9783038599890
ISBN-13 (eBook):
9783035706734
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