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HomeSolid State PhenomenaSolid State Phenomena Vol. 134Advanced Metrologies for Cleans Characterization:...

Advanced Metrologies for Cleans Characterization: ARXPS, GIXF and NEXAFS

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Ultra Clean Processing of Semiconductor Surfaces VIII

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Periodical:

Solid State Phenomena (Volume 134)

Pages:

281-284

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.134.281

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Online since:

November 2007

Authors:

Thierry Conard, Scott List, Martine Claes, Burkhard Beckhoff

Keywords:

Clean, GIXF, NEXAFS, Residue, X-Ray Photoelectron Spectroscopy (XPS)

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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