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Articles by author: Hugo Águas

• Batch Processing Method to Deposit a-Si:H Films by PECVD
  Published in: Advanced Materials Forum II (p104)
• Composition, Structure and Optical Characteristics of Polymorphous Silicon Films Deposited by PECVD at 27.12 MHz
  Published in: Advanced Materials Forum II (p100)
• Effect of Annealing on Gold Rectifying Contacts in Amorphous Silicon
  Published in: Advanced Materials Forum II (p96)
• Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz
  Published in: Advanced Materials Forum II (p532)
• Highly Conductive/Transparent ZnO:Al Thin Films Deposited at Room Temperature by rf Magnetron Sputtering
  Published in: Advanced Materials Forum I (p571)
• Influence of the Plasma Regime on the Structural, Optical and Transport Properties of a-Si:H Thin Films
  Published in: Advanced Materials Forum I (p583)
• Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films
  Published in: Plasma Processing and Dusty Particles (p11)
• Insights on Amorphous Silicon Nip and MIS 3D Position Sensitive Detectors
  Published in: Advanced Materials Forum III (p13)
• MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge
  Published in: Advanced Materials Forum II (p73)
• Multifunctional Thin Film Zinc Oxide Semiconductors: Application to Electronic Devices
  Published in: Advanced Materials Forum III (p3)
• Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition
  Published in: Advanced Materials Forum II (p112)
• Role of the i-Layer Thickness in the Performance of a-Si:H Schottky Barrier Photodiodes
  Published in: Advanced Materials Forum I (p587)
• Silicon Etching in CF₄/O₂ and SF₆ Atmospheres
  Published in: Advanced Materials Forum II (p120)
• Silicon Films Produced by PECVD under Powder Formation Conditions
  Published in: Plasma Processing and Dusty Particles (p21)
• Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications
  Published in: Advanced Materials Forum II (p69)