Effect of Oxidation Temperature on the Properties of CuO Thin Films Prepared by Thermal Oxidation of Sputtered Cu Thin Films

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Abstract:

CuO thin films were obtained through thermal oxidation of dc magnetron sputtered metallic Cu films on glass substrates. Thermal oxidation process was performed in air at temperature ranging 300-500 °C. From XRD patterns, CuO single phase of monoclinic structure was formed at oxidation temperature beyond 450 °C whereas amorphous phase with very small grains was obtained at oxidation temperature below 450 °C. The positive sign of the Hall coefficient confirmed the p-type conductivity in all studied films. From transmission spectra, direct band gap value is varied between 2.17 and 2.83eV. From the transient photoconductivity measurements, persistent photoconductivity (PPC) behavior was observed. The decay current data were better fitted with the multiple exponential functions resulting into five slow decay times. Density of trap states corresponding to its decay time was also evaluated from the decay current data.

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6-11

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April 2015

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© 2015 Trans Tech Publications Ltd. All Rights Reserved

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