Characteristics of SiC Heteroepitaxial Growth on Si by Hot-Mesh Chemical Vapor Deposition

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The heteroepitaxial growth of 3C-SiC films on Si(100) substrates by the hot-mesh chemical vapor deposition (HM-CVD) method using monomethylsilane as a source gas was investigated. From the results of X-ray diffraction spectra, 3C-SiC crystal was epitaxially grown on Si substrates at substrate temperatures above 750°C. The SiC/Si interface was observed by cross-sectional scanning electron microscopy, and was confirmed to be void-free and smooth. The density of hydrogen radicals supplied to the substrate surface during the growth was also estimated measuring the optical absorbance change of tungsten phosphate glass plates. From the dependence of the growth rate on substrate temperature, the mechanism of SiC film growth by HM-CVD was considered.

Info:

Periodical:

Advanced Materials Research (Volumes 11-12)

Main Theme:

Edited by:

Masayuki Nogami, Riguang Jin, Toshihiro Kasuga and Wantai Yang

Pages:

265-268

DOI:

10.4028/www.scientific.net/AMR.11-12.265

Citation:

T. Kurimoto et al., "Characteristics of SiC Heteroepitaxial Growth on Si by Hot-Mesh Chemical Vapor Deposition", Advanced Materials Research, Vols. 11-12, pp. 265-268, 2006

Online since:

February 2006

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Price:

$35.00

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[4] 5 5 200 600 1000 1400 1800 2200 2600 Wavelength [nm] Absorbance before After Fig. 5. Absorption spectra of glass plates before and after H atom exposure. 0 1 2 3 4 5 6 7.

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[5] 0 Absorbance difference before and after H atom exposure H atom density [x 10 12 /cm 3 ] Morimoto et al. [9] our experiment Fig. 6. Dependence of the change in absorbance on H atom density.

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