Advances in Abrasive Technology XIII

Volumes 126-128

doi: 10.4028/

Paper Title Page

Authors: Kazuya Yamamura, Tatsuya Takiguchi, Masaki Ueda, Azusa N. Hattori, Nobuyuki Zettsu

Abstract: A novel machining method combined with the irradiation of atmospheric pressure plasma was proposed for the finishing of difficult-to-machine...

Authors: Yong Guang Wang, Liang Chi Zhang

Abstract: Chemo-mechanical polishing (CMP) has been a useful method to produce superior brittle wafer surfaces. This paper reviews the CMP of silicon...

Authors: Fei Hu Zhang, Xing Bin Yu, Yong Zhang, Yong Yong Lin

Abstract: Ultrasonic- magnetorheological combined finishing (UMC) is a new technique for the ultraprecision machining of aspheric surfaces, especially...

Authors: Shinichi Ninomiya, Manabu Iwai, Kazuyoshi Takano, Toshiharu Shimizu, Kiyoshi Suzuki

Abstract: This paper deals with a technique to easily suppress bad odor of water-soluble coolant (working fluid) by using a commercially available ion...

Authors: Ken Chuan Cheng, Kuan Yu Chen, A Cheng Wang, Yan Cherng Lin

Abstract: Abrasive flow machining (AFM) is a simple and efficient method to remove recasting layers making by wire electrical discharge machining...

Authors: Shizuichi Higuchi, Mitsuru Sugisaki, Hideo Kato, Kazuya Okawa

Abstract: Pyramidal structured lapping film, which has minute pyramidal structures formed by abrasive grains and adhesives on polyester films, is...

Authors: Pai Shan Pa

Abstract: This paper studies the performance assessment of magnetic-assistance electrochemical finishing using an effective design system and magnetic...

Authors: Alex Fang, Elena Castell Perez, Alex Puerta Gomez, Song Sheng Zhou, Jason Sowers

Abstract: This paper is aimed at developing an efficient process, in terms of the material removal rate (MRR), for the lapping of polycrystalline...

Authors: Yin Biao Guo, Wei Yang, Zhen Chen, Yun Feng Peng

Abstract: In this paper, the with-in-wafer non-uniformity (WIWNU) of the lager quadrate optic in the fast polishing process (FPP) is discussed from...

Authors: Wataru Natsu, Takeshi Miyata

Abstract: In this study, a method is proposed to fabricate the polishing tool with an elastic membrane in thickness of 10 to 120μm, by using the...


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