Advances in Abrasive Technology XIII

Volumes 126-128

doi: 10.4028/

Paper Title Page

Authors: Feng Jiao, Chong Yang Zhao, Bo Zhao

Abstract: For the precision engineering ceramics parts, semi-ductile regime machining technologies are usually adopted to obtain the final surface. It...

Authors: Takao Kubo, Shiro Ota, Masatoshi Oda, Kenichi Hashishita, Yasuhiro Kakinuma

Abstract: Viscoelastic polymers are used as one of coating materials for protecting the products from scratches. Presently, the repair of the coating...

Authors: Shingo Tsubota, Wataru Natsu

Abstract: The purpose of this research is to establish a way to realize the axisymmetric free-form polishing by controlling the scanning speed of the...

Authors: Arif Wahjudi, Fang Jung Shiou

Abstract: This study proposes an innovative sphere-like tool for polishing process in the machining center. It can be applied not only z-axis rotation...

Authors: Yong Guang Wang, Liang Chi Zhang, Altabul Biddut

Abstract: This paper investigates the effects of some chemical factors on the material removal rate (MRR) in chemo-mechanical polishing (CMP) of Si...

Authors: Gui Bing Pang, Xieeryazidan Adayi, Wen Ji Xu, Yan Ping Peng, J.J. Zhou

Abstract: The service properties and lives of mechanical parts and components are closely related to their surface quality and precision, and many of...

Authors: Shinichi Ninomiya, Manabu Iwai, Gaku Sugino, Takuya Takada, Kiyoshi Suzuki

Abstract: Electrically conductive polycrystalline composite diamond (EC-PCD), which consists of electrically conductive diamond grits, has recently...

Authors: Mîng Chih Hung, Yao Yang Tsai, Lin Wang

Abstract: In the past half century, EDM (electrical discharge machining) is one of the most popular methods for manufacturing casting and plastic...

Authors: Gui Bing Pang, Wen Ji Xu, Jin Jin Zhou, Dian Ming Li

Abstract: Gears’ surface quality and modification characteristic have an important influence on its working performance. Pulse Electrochemical...

Authors: Sung Lin Tsai, Fuang Yuan Huang, Biing Hwa Yan, Yao Ching Tsai

Abstract: This paper presents a new polishing pad with polishing silicon surface composed of a layer of Ethylene-vinyl acetate (EVA) adhesive pad...


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