Fabrication of Photonic Crystals by Holographic Lithography Method

Jong Bin Yeo; Hyun Yong Lee

doi:10.4028/www.scientific.net/AMR.31.98

Paper Titles

Surface Structure Dependent Growth of InAs/InAlAs Quantum Wires on InP(100).
p.86

Characteristics of Ge Nanocrystals Grown by RF Magnetron Sputtering
p.89

Photoluminescence and Fractal Properties of Diverse Carbothermal Zinc Oxide Nanostructures
p.92

Band Structure and Optical Gain of 1.3 um GaAsSbN/GaAs Compressively Strained Quantum Well Laser
p.95

Fabrication of Photonic Crystals by Holographic Lithography Method
p.98

Optical and Structural Properties of Multi Deposition Film Derived SiO₂-TiO₂ Systems by Sol-Gel Process
p.101

Investigation of Intersubband Transition in GaAs/AlGaAs Quantum Well Infrared Photodetectors
p.105

Growth of GaN Nano-Column on Si (111) Substrate Using Au+Ga Alloy Seeding by Pulsed Flow Method Using MOCVD
p.108

Raman study of Epitaxial lateral Overgrowth of GaN on Patterned Sapphire Substrate
p.111

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 31Fabrication of Photonic Crystals by Holographic...

Fabrication of Photonic Crystals by Holographic Lithography Method

Abstract:

In this study, we found out the new fabrication process condition for Photonic crystals(PCs). PCs were fabricated by holographic lithography(HL), instead of commonly used electron beam lithography(EBL). HL process enable periodic large area fabrication of PCs. Also this method can easily control the pitch of periodic patterns. We set up holographic lithography system by laser and some optical components. The source of light used laser of 442 nm wavelength. Photo-resist(PR) used DMI-150 model. The viscosity of PR is diluted with propylene glycol monomethyl ether acetate(PGMEA) which is solvent for DMI-150. This experiment is holographic lithography of rotated double exposure method for PCs pattern. The method use only one beam. Result data is shown by atomic force microscope(AFM), scanning electron microscope(SEM) and 3D contour image. At the this study, we conclude conditions which we need periodic structure for PCs. It is some factor. For example, incident angle, exposure time, rotation angle, etc. And we show incident angle calculation recipe for needed size of periodic patterns. We already manufacture PCs structure design and simulation tool. Nano structure of this paper’s result is applied to designed PCs patterns.