Effect of RF Power on Optimization of Titanium Dioxide Nanostructures by RF Magnetron Sputtering

N.A.M. Asib; Mohamed Zahidi Musa; Saifollah  Abdullah; Mohamad Rusop

doi:10.4028/www.scientific.net/AMR.667.104

Paper Titles

Electrical Contact of Au with CNTs Deposited at Different Deposition Temperatures on Silicon Substrate
p.80

ZnO Nanostructures – Nanorods and Flower-Like on Si/Au Substrates by Solution-Immersion Method in Different pH of Precursor
p.86

Ac Conductivity Study of Hexanoyl Chitosan-LiCF₃SO₃-EC-Al₂O₃ Nanocomposite Polymer Electrolytes
p.93

The Raman Spectra of Nanocomposite Clusters of Atoms in Phosphorous-Selenium Glassy State
p.99

Effect of RF Power on Optimization of Titanium Dioxide Nanostructures by RF Magnetron Sputtering
p.104

Annealing Effect on the Surface Morphology and Photoluminescence Properties of ZnO Nanorod Prepared by Catalytic-Immersion Method Grown on Si and Au/Si Substrate
p.110

Dispersion of TiO₂ Nanopowder in the PMMA Matrix Prepared by Sonication-Solution Casting Method
p.115

Characterization of CdS Nanoparticles Synthesized Using Microwave-Assisted Polyol Method
p.122

Atomic Force Microscope (AFM) Studies of TiO₂Nanocoated Glass Surface via Sol-Gel Coating
p.128

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 667Effect of RF Power on Optimization of Titanium...

Effect of RF Power on Optimization of Titanium Dioxide Nanostructures by RF Magnetron Sputtering

Abstract:

Optimization of titanium dioxide (TiO2) nanostructures deposited on glass substrate by Radio Frequency (RF) magnetron sputtering has been studied. The aim of this paper is to determine which parameter of RF powers influence the optimization of TiO2 nanostructures. The surface morphology and topology, roughness properties and cross-sectional of TiO2 nanostructures were observed by Atomic Force Microscope (AFM). The particle size of TiO2 nanostructures were observed by Field Emission Scanning Electrons Microscope (FESEM) and the UV-vis transmission spectra were recorded using UV-vis spectroscopy. The lowest surface roughness has the smallest average TiO2 size particle with indirect optical band gap of 3.39 eV for optimum TiO2 nanostructures deposited at varies RF power.

You might also be interested in these eBooks

View Preview

Info:

Periodical:

Advanced Materials Research (Volume 667)

Pages:

104-109

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.667.104

Citation:

Cite this paper

Online since:

March 2013

Authors:

N.A.M. Asib, Mohamed Zahidi Musa, Saifollah Abdullah, Mohamad Rusop

Keywords:

Nanostructure, RF Magnetron Sputtering, RF Power, Titanium Dioxide (TiO₂)

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] M. Abdul Khadar, N.A. Mohemmed Shanid, Nanoscale fine-structure evaluation of RF magnetron sputtered anatase films using HRTEM, AFM, micro-Raman spectroscopy and fractal analysis, Surface & Coatings Technology. 204 (2010) 1366–1374.

DOI: 10.1016/j.surfcoat.2009.09.023

Google Scholar

[2] Y. Yang, Q. Zhang, B. Zhang, W.B. Mi, L. Chen, L. Li, C. Zhao, E.M. Diallo, X.X. Zhanga, The influence of metal inter layers on the structural and optical properties of nano-crystalline TiO2 films, Applied Surface Science. 258 (2012) 4532–4537.

DOI: 10.1016/j.apsusc.2012.01.020

Google Scholar

[3] Luis Castaneda, Mauricio Terrones, Synthesis and structural characterization of novel flower-like titanium dioxide nanostructures. Physica B. 390 (2007) 143-146.

DOI: 10.1016/j.physb.2006.08.004

Google Scholar

[4] Cheol Ho Heo, Soon-Bo Lee, Jin-Hyo Boo, Deposition of TiO2 thin films using RF magnetron sputtering method and study of their surface characteristics. Thin Solid Films. 475 (2005) 183– 188.

DOI: 10.1016/j.tsf.2004.08.033

Google Scholar

[5] S. Dangtip, N. Sripongphan, N. Boonyopakorn, C. Thanachayanont, Effects of rf-power and working pressure on formation of rutile phase in rf-sputtered TiO2 thin film. Ceramics International. 35 (2009)1281–1284.

DOI: 10.1016/j.ceramint.2008.04.018

Google Scholar

[6] Sea-Fue Wang, Yung-Fu Hsu, Yi-Shiang Lee, Microstructural evolution and optical properties of doped TiO2 films prepared by RF magnetron sputtering. Ceramics International. 32 (2006) 121–125.

DOI: 10.1016/j.ceramint.2005.01.010

Google Scholar

[7] Stefan Boyadzhiev, Velichka Georgieva, Milka Rassovska, Characterization of reactive sputtered TiO2 thin films for gas sensor applications, Journal of Physics: Conference Series. 253 (2010) 012040.

DOI: 10.1088/1742-6596/253/1/012040

Google Scholar

[8] Agatino Di Paola, G.C., Maurizio Addamo, Marianna Bellardita, Renzo Campostrini, Marco Ischia, Riccardo Ceccato, Leonardo Palmisano, Photocatalytic activity of nanocrystalline TiO2 (brookite, rutile and brookite-based) powders prepared by thermohydrolysis of TiCl4 in aqueous chloride solutions, Colloids and Surfaces A: Physicochem. Eng. Aspects. 317 (2008).

DOI: 10.1016/j.colsurfa.2007.11.005

Google Scholar

[9] S. Sankar, K.G. Gopchandran, P. Kuppusami, S. Murugesan, Spontaneously ordered TiO2 nanostructures, Ceramics International. 37 (2011) 3307–3315.

DOI: 10.1016/j.ceramint.2011.04.126

Google Scholar

[10] A. Dakka, J. Lafait, M. Abd-Lefdil, C. Sella, Optical study of titanium dioxide thin films prepared by R.F. sputtering, M.J. CONDENSED MATTER. 2 (1999).

DOI: 10.1051/epjap:2000206

Google Scholar

[11] K. Ozeki, Juliana M. Janurudin, H. Aoki, Y. Fukui, Photocatalytic hydroxyapatite/titanium dioxide multilayer thin film deposited onto glass using an rf magnetron sputtering technique, Applied Surface Science. 253 (2007) 3397–3401.

DOI: 10.1016/j.apsusc.2006.07.030

Google Scholar

[12] A. Sobczyk-Guzenda, M. Gazicki-Lipman, H. Szymanowski, J. Kowalski, P. Wojciechowski, T. Halamus, A. Tracz, Characterization of thin TiO2 films prepared by plasma enhanced chemical vapour deposition for optical and photocatalytic applications, Thin Solid Films. 517 (2009).

DOI: 10.1016/j.tsf.2009.01.010

Google Scholar

[13] Prabitha B. Nair, V.B. Justinvictor, Georgi P. Daniel, K. Joy, V. Ramakrishnan, P.V. Thomas, Effect of RF power and sputtering pressure on the structural and optical properties of TiO2 thin films prepared by RF magnetron sputtering, Applied Surface Science. 257 (2011).

DOI: 10.1016/j.apsusc.2011.07.125

Google Scholar