Stress in Silicon Nitride Films and Its Effect on Boron Diffusion in Silicon

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Periodical:

Defect and Diffusion Forum (Volumes 153-155)

Main Theme:

Edited by:

D.J. Fisher

Pages:

25-44

DOI:

10.4028/www.scientific.net/DDF.153-155.25

Citation:

S. Matsumoto et al., "Stress in Silicon Nitride Films and Its Effect on Boron Diffusion in Silicon", Defect and Diffusion Forum, Vols. 153-155, pp. 25-44, 1998

Online since:

November 1997

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$35.00

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