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Pressure and Stress Effects on Diffusion in Si
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Boron Diffusion in Pre-Amorphised Silicon: Interactions with the End of Range Defects
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Stress in Silicon Nitride Films and Its Effect on Boron Diffusion in Silicon
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Quantum Effects on Hydrogen Diffusion in Silicon
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Self-Diffusion in Silicon
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Diffusion of Si Adsorbates on an Si(001) Surface
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Vacancies and Vacancy Defects in Si Observed by Positron Annihilation
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Vacancy Distributions in Silicon and Methods for Their Accurate Determination
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Interaction and Migration Properties of Ion Beam Induced Point Defects in Crystalline Silicon: Basic Research and Technological Relevance
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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 153-155Pressure and Stress Effects on Diffusion in Si

Pressure and Stress Effects on Diffusion in Si

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Periodical:

Defect and Diffusion Forum (Volumes 153-155)

Pages:

1-10

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.153-155.1

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Online since:

November 1997

Authors:

M.J. Aziz

Keywords:

Antimony, Arsenic, Biaxial Stresses, Boron, Diffusion Mechanism, Dopant Diffusion, Germanium, Nonhydrostatic Stress, Self-Diffusion, Silicon, Thermodynamic

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© 1998 Trans Tech Publications Ltd. All Rights Reserved

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