Teh Effect of Boron Concentration upon Defect Formation after Laser Thermal Processing using Molecular Dynamics

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Periodical:

Defect and Diffusion Forum (Volumes 210-212)

Edited by:

D.J. Fisher

Pages:

71-80

DOI:

10.4028/www.scientific.net/DDF.210-212.71

Citation:

L. Wang et al., "Teh Effect of Boron Concentration upon Defect Formation after Laser Thermal Processing using Molecular Dynamics", Defect and Diffusion Forum, Vols. 210-212, pp. 71-80, 2002

Online since:

November 2002

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$35.00

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